›› 2014, Vol. 27 ›› Issue (2): 112-.

• Articles • Previous Articles     Next Articles

Effect of p-electrode Grid Spacing on InGaN Based Photovoltaic Cells

 YANG Zhuo, LI Pei-Xian, ZHANG Kai, ZHOU Xiao-Wei   

  1. (1.School of Technical Physics,Xidian University,Xi'an 710071,China;
    2.Key Laboratory of Ministry of Education for Wide Bandgap Semiconductor Materials and Devices,Xidian University,Xi'an 710071,China)
  • Online:2014-02-15 Published:2014-01-12

Abstract:

In this study,InGaN/GaN multiple quantum well (MQW) structures photovoltaic cells are grown by metal-organic chemical vapor deposition (MOCVD) on the sapphire substrate.Mesh grid p-electrode of two different kinds of shapes with varying mesh grid spacing are fabricated as well.It is found that as mesh grid spacing decrease,the area of the electrode increases and the absorption area decreases,causing degradation in the photovoltaic cells.It is also observed that cells whose p-electrode gird deposited at the edges of the chips achieve preferred performance due to the existence of stronger electric fields at the MESA edges.

Key words: InGaN;photovoltaic;p-electrode;grid spacing

CLC Number: 

  • TM914.4