›› 2013, Vol. 26 ›› Issue (1): 12-.

• Articles • Previous Articles     Next Articles

Study of Mg-doped Nonpolar a-plane GaN Films Annealing Temperature

YANG Yang,LI Peixian,ZHOU Xiaowei,JIA Wenbo,ZHAO Xiaoyun   

  1. (Key Lab.of Wide Band-Gap Semiconductor Materials and Devices of Ministry of Education,Xidian University,Xi'an 710071,China)
  • Online:2013-01-15 Published:2013-03-08

Abstract:

The nonpolar GaN materials solve the polarization of conventional GaN materials,and thus have a good prospect of application.Mg-dopoed nonpolar a-plane GaN film is grown on r-plane sapphire by metal organic chemical vapor deposition method,and three temperatures of 650 ℃,750 ℃ and 850 ℃ are selected to study the annealing temperature of Mg-doped nonpolar GaN films.With an atomic force microscope (AFM),photoluminescence spectroscopy (PL) and Raman spectra (Raman),the surface morphology of the material,optical properties,and surface stress are studied.Best results are obtained when annealed at 750 ℃.

Key words: nonpolar;GaN;AFM;PL;Raman

CLC Number: 

  • TN304