西安电子科技大学学报 ›› 2023, Vol. 50 ›› Issue (1): 102-108.doi: 10.19665/j.issn1001-2400.2023.01.012

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一种砷化镓工艺的双向真时延芯片设计

郝东宁(),张为()   

  1. 天津大学 微电子学院,天津 300072
  • 收稿日期:2022-02-23 出版日期:2023-02-20 发布日期:2023-03-21
  • 作者简介:郝东宁(1991—),男,天津大学博士研究生,E-mail:dnhao@tju.edu.cn;|张为(1975—),男,教授,博士,E-mail:tjuzhangwei@tju.edu.cn
  • 基金资助:
    国家基础加强重点项目基金(2019JCJQZD24603)

GaAs bidirectional true time delay chip design

HAO Dongning(),ZHANG Wei()   

  1. School of Microelectronics,Tianjin University,Tianjin 300072,China
  • Received:2022-02-23 Online:2023-02-20 Published:2023-03-21

摘要:

采用0.25 μm GaAs pHEMT E/D工艺实现了X/ Ku波段的双向真时延芯片的设计。通过在新型长号型延时结构中增加双向选择开关,实现了低插入损耗波动的双向数控可调真时延电路。其延时单元采用四阶和二阶电感耦合全通滤波器实现,单位面积下具有较高的延时量,并通过双向有源开关选择延时路径来控制延时大小。延时芯片的工作带宽为6~18 GHz,可实现3位延时,最小延时步进为15 ps,最大延时范围为106 ps。仿真结果表明,其具有相对较低的插入损耗8.1 ~ 15 dB,且损耗随时延的波动小于±2 dB。芯片尺寸为1.91 mm2,群时延均方根误差小于10 ps,回波损耗大于15 dB,直流功耗为110 mW,输入1 dB压缩点大于7 dBm。

关键词: 真时延, 延时电路, 砷化镓, 全通滤波器, 低插入损耗波动

Abstract:

An X/Ku-band bi-directional True-time delay is presented in 0.25 μm GaAs pHEMT E/D technology.The bi-directional operation is realized by adding two-way selecting switches to the new trombone structure,and it has the advantage of low insertion loss variation among different delay states.Fourth-order and second-order inductive coupled all-pass networks are adopted to form two delay lines.The delay differences are controlled by selecting the delay path through the bi-directional active switches.The true-time delay operates with the bandwidth of 6~18 GHz,and it realizes a 3-bit delay with a minimal delay step of 15 ps and a maximal delay of 106 ps.Simulation results show insertion loss of 8.1~15 dB and the loss variation with delay is ±2 dB.The group delay Root-Mean-Square error less than 10 ps and return loss more than 15 dB are implemented with the chip size of 1.91 mm2.The direct current consumption is 110 mW and the input P1dB is more than 7 dBm.

Key words: time delay, delay circuit, gallium arsenide, all-pass filters, low loss variation with delay

中图分类号: 

  • TN432