J4 ›› 2010, Vol. 37 ›› Issue (6): 1082-1087+1131.doi: 10.3969/j.issn.1001-2400.2010.06.018

• 研究论文 • 上一篇    下一篇



  1. (西安电子科技大学 宽禁带半导体材料与器件教育部重点实验室,陕西 西安  710071)
  • 收稿日期:2010-04-22 出版日期:2010-12-20 发布日期:2011-01-22
  • 通讯作者: 董刚
  • 作者简介:董刚(1978-),男,副教授,博士,E-mail: gdong@mail.xidian.edu.cn.
  • 基金资助:


Crosstalk noise estimation of two adjacent RC interconnects with process variations

DONG Gang;YANG Yang;CHAI Chang-chun;YANG Yin-tang   

  1. (Ministry of Education Key Lab. of Wide Band-Gap Semiconductor Materials and Devices, Xidian Univ., Xi'an  710071, China)
  • Received:2010-04-22 Online:2010-12-20 Published:2011-01-22
  • Contact: DONG Gang



关键词: 工艺波动, RC互连, 串扰噪声, 统计模型


Based on the six-node template circuit of coupling interconnects, a novel method for analyzing the statistical crosstalk noise of RC interconnects with process variations is proposed. Analytical expressions for mean and standard deviation of the statistical crosstalk noise are derived for a given fluctuation range of interconnect parameters. Simulation results show that the time of calculation is greatly shortened with a good calculating precision using the proposed statistical model as compared to the widely used Monte Carlo method. Calculated results also indicate that the errors of the mean and standard deviation are less than 2.36% and 7.23% respectively.

Key words: process variations, RC interconnect, crosstalk noise, statistical model