ALD淀积温度对HfO2高k栅介质材料特性的影响
匡潜玮;刘红侠;樊继斌;马飞;张言雷
Investigation of the influence of deposition temperature on ALD deposite HfO2 high k gate material
KUANG Qianwei;LIU Hongxia;FAN Jiwu;MA Fei;ZHANG Yanlei
J4
.
2012, (2): 164
-167
.
DOI: 10.3969/j.issn.1001-2400.2012.02.027
