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中文
Investigation of the influence of deposition temperature on ALD deposite HfO
2
high k gate material
KUANG Qianwei;LIU Hongxia;FAN Jiwu;MA Fei;ZHANG Yanlei
J4 . 2012, (
2
): 164 -167 . DOI: 10.3969/j.issn.1001-2400.2012.02.027
