关键词: 磁控溅射, &beta, -FeSi2薄膜, 晶体结构, 形貌特征

Abstract:

The magnetron sputtering method with the sputtering chamber backing vacuum better than 2.0 × 10-5 Pa,is used.A layer of Fe film(150 nm~330 nm) is deposited on the substrate of the Si(100) (electrical resistivity of 7~13 Ωcm) at different powers.Then at 900 ℃,it is annealed for 15 hours with the backing being vacuum(4 × 10-4 Pa) to form a βFeSi2.The scanning electron microscopy(SEM) is used to characterize its surface morphology structure.The Xray diffraction(XRD) is used to analyze its crystal structure.When the sputtering power is 70~100 W,the main diffraction peak is derived from βFeSi2,but at 2θ=45 °a relatively large FeSi large peak appears,and a larger Fe5Si3 peak appears in the vicinity of 2θ=38 °.The results show that the best preparation for the βFeSi2 film is annealing at 900 ℃ for 15 hours with a sputtering power of 110 W.

Key words: magnetron sputtering;βFeSi2 film;crystal structure;morphology