金刚石悬浮液抛光单晶锗片实验研究

doi:10.16180/j.cnki.issn1007-7820.2021.03.002

摘要/Abstract

摘要：

为了研究抛光参数对单晶锗片表面质量、材料去除量的影响,文中使用单晶金刚石悬浮抛光液对单晶锗片进行抛光实验,利用正交实验法确定最优工艺参数组合、各因素对工件抛光效果影响程度和影响趋势。结果表明16组实验中,R_a下降量为0.848~0.998 μm,使用小粒度的单晶金刚石悬浮抛光液能大幅提升单晶锗片表面质量。各因素对工件表面粗糙度影响的主次顺序(主→次)为:磨粒粒度、抛光时间、加载压力、磨抛头主轴转速;最优参数组合为磨粒粒度0.25 μm、磨抛头主轴转速70 rpm、加载压力8 kg、抛光时间90 min。磨粒粒度对工件表面粗糙度的影响满足Preston方程。加载压力对工件表面粗糙度的影响结果与单晶锗(111)晶面表现出的尺寸效应相符,且抛光参数对工件材料去除的影响满足Seok材料去除率模型。

关键词: 光学材料, 成像质量, 单晶锗, 金刚石抛光液, 正交实验, 尺寸效应

Abstract:

In order to study the effect of polishing parameters on the surface quality and material removal of single crystal germanium flakes, single crystal diamond suspension polishing liquid is used to polish the single crystal germanium flakes. The optimal process parameter combination is determined, and the degree and trend of influence of each polishing parameter on the polishing quality is analyzed by orthogonal experiment. Experimental results show that the drop of R_a is 0.848~0.998 μm in 16 experiments. The surface quality of single crystal germanium flakes can be greatly improved if a small particle size single crystal diamond suspension polishing liquid is utilized. The primary and secondary order (primary→secondary) of the influence degree of each parameter on the surface roughness are abrasive grain size, polishing time, loading pressure, spindle speed of polishing head. The optimal parameter combination is shown as: abrasive grain size 0.25 μm; spindle speed of polishing head 70 rpm; loading pressure 8 kg; polishing time 90 min. The effect of abrasive grain size on the surface roughness of the workpiece satisfies the Preston equation. The effect of loading pressure on the surface roughness of the workpiece is consistent with the size effect exhibited by the single crystal germanium (111) crystal plane, and the effects of polishing parameters on the material removal of the workpiece meet the Seok material removal rate model.

Key words: optical material, imaging quality, single crystal germanium, diamond polishing liquid, orthogonal experiment, size effect

中图分类号:

TN213

杨晓京,赵垒. 金刚石悬浮液抛光单晶锗片实验研究[J]. 电子科技, 2021, 34(3): 6-12.

YANG Xiaojing,ZHAO Lei. Experimental Study on Polishing Single Crystal Germanium Flakes with Diamond Suspension Polishing Liquid[J]. Electronic Science and Technology, 2021, 34(3): 6-12.

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	A	B	C	D
	磨粒粒度 /μm	磨抛头主轴转速/rpm	加载压力 /kg	抛光时间 /min
水平1	0.25	40	6	30
水平2	3.00	50	7	50
水平3	6.00	60	8	70
水平4	9.00	70	9	90

试验编号	抛光前 R_a/μm	抛光后 R_a/μm	R下降量 /μm	抛光前质量/g	抛光后质量/g	质量下降量/g
1	0.949	0.064	0.885	0.273 7	0.271 1	0.002 6
2	0.946	0.021	0.925	0.277 7	0.270 4	0.007 3
3	0.983	0.003	0.980	0.274 4	0.259 2	0.015 2
4	1.052	0.054	0.998	0.272 8	0.253 3	0.019 5
5	0.933	0.018	0.915	0.277 4	0.262 0	0.015 4
6	0.917	0.005	0.912	0.273 7	0.257 1	0.016 6
7	0.928	0.029	0.899	0.275 5	0.258 7	0.016 8
8	0.963	0.037	0.926	0.275 0	0.253 3	0.021 7
9	0.960	0.042	0.918	0.272 5	0.246 3	0.026 2
10	0.964	0.044	0.920	0.275 1	0.248 0	0.027 1
11	0.866	0.008	0.858	0.277 2	0.261 6	0.015 6
12	0.911	0.032	0.879	0.274 6	0.264 2	0.010 4
13	0.937	0.089	0.848	0.274 0	0.261 1	0.012 9
14	0.914	0.066	0.848	0.274 3	0.263 2	0.011 1
15	0.923	0.034	0.889	0.275 6	0.238 8	0.036 8
16	0.920	0.044	0.876	0.277 3	0.247 5	0.029 8

	A:磨粒粒度	B:磨抛头主轴转速	C:加载压力	D:抛光时间
k₁	3.788	3.566	3.531	3.511
k₂	3.652	3.605	3.608	3.557
k₃	3.575	3.626	3.672	3.691
k₄	3.461	3.679	3.665	3.717
K₁	0.947	0.892	0.883	0.878
K₂	0.913	0.901	0.902	0.889
K₃	0.894	0.907	0.918	0.923
K₄	0.865	0.920	0.916	0.929
极差R	0.082	0.028	0.035	0.051

	A:磨粒粒度	B:磨抛头主轴转速	C:加载压力	D:抛光时间
k₁	0.044 6	0.057 1	0.064 6	0.040 9
k₂	0.070 5	0.062 1	0.069 9	0.057 5
k₃	0.079 3	0.084 4	0.074 2	0.087 5
k₄	0.090 6	0.081 4	0.076 3	0.099 1
K₁	0.011 2	0.014 3	0.016 2	0.010 2
K₂	0.017 6	0.015 5	0.017 5	0.014 4
K₃	0.019 8	0.021 1	0.018 6	0.021 9
K₄	0.022 7	0.020 4	0.019 1	0.024 8
极差R	0.011 5	0.006 8	0.002 9	0.014 6