J4 ›› 2009, Vol. 36 ›› Issue (6): 1049-1052+1058.

• Original Articles • Previous Articles     Next Articles

Study of (112-0) non polar a-plane GaN on the (11-02) r-plane sapphire

XU Sheng-rui;DUAN Huan-tao;HAO Yue;ZHANG Jin-cheng;ZHANG Jin-feng;NI Jin-yu;HU Shi-gang;LI Zhi-ming   

  1. (Ministry of Education Key Lab. of Wide Band-Gap Semiconductor Materials and Devices, Xidian Univ., Xi'an  710071, China)
  • Received:2008-09-06 Online:2009-12-20 Published:2010-01-20
  • Contact: XU Sheng-rui E-mail:shengruixidian@126.com

Abstract:

The spontaneous and piezoelectric polarizatio represent one of the unsolved problems in utilizing GaN for fabricating light-emitting devices. To solve the problem, non-polar GaN structures have been studied. Low-temperature AlN buffers are used for (112-0) a-plane GaN growth on the (11-02) r-plane sapphire. A combination of atomic force microscopy (AFM), high resolution X-ray diffraction (XRD) and photoluminescence (PL) spectrum is used to characterize dislocation of the (112-0) a-plane and (0001) c-plane GaN epilayer. Compared with the typical hexagonal dislocation of c-plane GaN, this shows great difference with the conventional polar GaN, and the pit of the a-plane GaN epilayer is triangle, with the possible formation mechanisms of these faults discussed and the triangular pit directions also investigated.

Key words: dislocation, GaN, X-ray diffraction, nonpolar

CLC Number: 

  • TN325